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Nb1 Nb2 RO4200 Niobium Coating Target 1. Description of Nb1 Nb2 RO4200 Niobium Coating Target: Name:Niobium coating target Grade:Nb1.Nb2. Standard:ASTM B393 Purity:≥99.95% Round target size:dia(25-400)xThickness (3-28)mm Square:Thickness (1-20)xWidth (10...
Nb1 Nb2 RO4200 Niobium Coating Target 1. Description of Nb1 Nb2 RO4200 Niobium Coating Target: Name:Niobium coating target Grade:Nb1.Nb2. Standard:ASTM B393 Purity:≥99.95% Round target size:dia(25-400)xThickness (3-28)mm Square:Thickness (1-20)xWidth (10... more
Brand Name:PRM
Model Number:Custom
Place of Origin:China
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...-2, Nb1Zr, Nb10Zr Shape Circular Size Diameter 25mm up to 400mm x Thickness 3mm up to 28mm Rectangular targets Thickness 1mm up to 12.7mm x Width up to 600mm x Length up to 2000mm Purity >=99.95% or 99.99% Designation:Nb1,...
...-2, Nb1Zr, Nb10Zr Shape Circular Size Diameter 25mm up to 400mm x Thickness 3mm up to 28mm Rectangular targets Thickness 1mm up to 12.7mm x Width up to 600mm x Length up to 2000mm Purity >=99.95% or 99.99% Designation:Nb1,... more
Brand Name:Fitow
Model Number:fm20150402
Place of Origin:china
High Purity 99.95% Niobium Round Target for Coating
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.../Gr7/Gr9/Gr12 Origin Baoji city Shaanxi Province china shape Round target / plate target / tube target Titanium content ≥99.6 (%) Impurity content <0.02 (%) Density 4.51 or 4.50 Standard ASTM B381 Size 1.Diameter 98mm ...
.../Gr7/Gr9/Gr12 Origin Baoji city Shaanxi Province china shape Round target / plate target / tube target Titanium content ≥99.6 (%) Impurity content <0.02 (%) Density 4.51 or 4.50 Standard ASTM B381 Size 1.Diameter 98mm ... more
Brand Name:LHTi
Model Number:Titanium target
Place of Origin:China
Polished Titanium Sputter Target / Vacuum Coating Titanium Target
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... , Compound , and various ceramic target , such as Oxide , Nitride , Carbide , Boride , Sulfide , Selenide and Telluride sputter target .We provide a complete line of sputtering target materials suitable for Pulsed Laser Deposition ( PLD ) systems and
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...materials onto a substrate. Sputtering is a process in which atoms from the target material are ejected and deposited onto a substrate, creating a thin film. Tungsten sputtering targets are made from high-purity tungsten and are used for applications that
...materials onto a substrate. Sputtering is a process in which atoms from the target material are ejected and deposited onto a substrate, creating a thin film. Tungsten sputtering targets are made from high-purity tungsten and are used for applications that more
Brand Name:HaiChuan
Model Number:60
Place of Origin:China
High Quality High Purity High Density Forged Tungsten Sputtering Target
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... sheets, base plates, sputtering targets, crucibles in electronic and vacuum applications. Molybdenum sputtering targets possess higher density and smaller average particle size, so that you can benefit from a faster process due to higher sputtering speed.
... sheets, base plates, sputtering targets, crucibles in electronic and vacuum applications. Molybdenum sputtering targets possess higher density and smaller average particle size, so that you can benefit from a faster process due to higher sputtering speed. more
Model Number:Mo1 Molybdenum Plate
Minimum Order Quantity:Negotiate
Price:Negitionable
Mo1 Chrome Molybdenum Steel Plate ASTM B386 For Molybdenum Sputtering Target
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...Sputtering Target Tungsten target, WTi sputtering target , The tungsten sputtering target is an important substrate for the tungsten oxide film to realize its functional transition in the semiconductor device. Due to the high melting point of tungsten, tungsten targets are mainly prepared by powder metallurgy Description The tungsten sputtering target...
...Sputtering Target Tungsten target, WTi sputtering target , The tungsten sputtering target is an important substrate for the tungsten oxide film to realize its functional transition in the semiconductor device. Due to the high melting point of tungsten, tungsten targets are mainly prepared by powder metallurgy Description The tungsten sputtering target... more
Brand Name:JINXING
Model Number:Tungsten Sputtering Target
Place of Origin:China
Fine Grain Size Tungsten Sputtering Target With Hip / Cip / Forge Process
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...below 300mm and the thickness is above 0.3mm. Widely used in vacuum coating industry, target materials raw materials, aerospace industry, Marine automobile industry, electrical industry, instruments industry, etc. We produce tungsten targets that made with
...below 300mm and the thickness is above 0.3mm. Widely used in vacuum coating industry, target materials raw materials, aerospace industry, Marine automobile industry, electrical industry, instruments industry, etc. We produce tungsten targets that made with more
Brand Name:FOTMA
Model Number:Customized Tungsten Targets
Place of Origin:P.R. China
ASTM B760 Polished Tungsten Sputtering Target 100mm Tungsten Disc
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zirconium round target price,sputtering target for coating 1. Product name: High purity Zirconium Targets 2. Purity: Zr+Hf>99.95%, Hf<300ppm. 3. Confirmation: ISO9001:2008certified 4. Standard:GB/T OR ASTM 5.Trace Elements ...
zirconium round target price,sputtering target for coating 1. Product name: High purity Zirconium Targets 2. Purity: Zr+Hf>99.95%, Hf<300ppm. 3. Confirmation: ISO9001:2008certified 4. Standard:GB/T OR ASTM 5.Trace Elements ... more
Brand Name:Hongtech-TI
Model Number:1pc
Place of Origin:china
zirconium round target price,sputtering target for coating
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...properties Titanium-niobium sputtering targets are mainly used in the electronics and information industries, such as integrated circuits, information storage, liquid crystal displays, laser memory, electronic ...
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...sputter pure metal targets like: Chrome, Titanium, Aluminum, Copper, Stainless Steel, Nickle, Silver, Gold for high conductive films. DC Sputtering is a Thin Film Physical Vapor Deposition (PVD) Coating technique where a target material to be used as the
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...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering
...Sputtering Target For Coating Introduction of Molybdenum Sputtering Target Product Name Purity Density Surface Processing Mo target 99.95% 10.22g/cm3 Ground Rolling The molybdenum sputtering target has the characteristics of high purity, high density and fine grain, so that the sputtering efficiency, uniform film thickness and smooth etching surface are obtained in sputtering. There are two kinds of molybdenum sputtering more
Brand Name:Sanhui
Model Number:Mo1
Place of Origin:Henan, China
10.2g/Cm3 Pure Molybdenum Rectangular/Round Plate Sputtering Target For Coating
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2.5MPa Steam Blowing Aluminum Target Plate High Temperature Sputtering Aluminum Target Plate Mirror Aluminum Target Plat *, *::before, *::after {box-sizing: border-box; } * {margin: 0; } html, body {height: 100%; } body {line-height: 1.5; -webkit-font-...
2.5MPa Steam Blowing Aluminum Target Plate High Temperature Sputtering Aluminum Target Plate Mirror Aluminum Target Plat *, *::before, *::after {box-sizing: border-box; } * {margin: 0; } html, body {height: 100%; } body {line-height: 1.5; -webkit-font-... more
Brand Name:ZeXu
Model Number:Drawing processing
Place of Origin:Yanshan, Hebei, China
2.5MPa Aluminum Steam Blowing Target Plate High Temperature Sputtering
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...Sputtering Target For CD-ROM , Decoration Description: Titanium Round Target Material Type Size Ti Target Ni Target Zr Target Mo Target Ti-Al Target SSTarget Round Common:Dia100*40,Dia80*40,Dia60*40 According to Customers' Requirements Plate Target Material Type Size Ti Target Ni Target Zr Target Mo Target Ti-Al Target SS Target Plate According to Customers' Requirements Applications: Titanium target...
...Sputtering Target For CD-ROM , Decoration Description: Titanium Round Target Material Type Size Ti Target Ni Target Zr Target Mo Target Ti-Al Target SSTarget Round Common:Dia100*40,Dia80*40,Dia60*40 According to Customers' Requirements Plate Target Material Type Size Ti Target Ni Target Zr Target Mo Target Ti-Al Target SS Target Plate According to Customers' Requirements Applications: Titanium target... more
Brand Name:NewFuture Titanium
Model Number:Titanium Sputtering Target
Place of Origin:Shanxi China (mainland)
PVD Titan Metal Sputtering Targets 99.7% Electronic Sputtering For CD ROM
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tantalum niobium alloy Ta-Nb target (Ta-3Nb,Ta-20Nb ,Ta-30Nb,Ta-40Nb) USE: It is widely used in the fields of aerospace industry, medical equipment and so on. It can be used in the chemical industry, such as the digester, heater, cooler, etc time limit...
tantalum niobium alloy Ta-Nb target (Ta-3Nb,Ta-20Nb ,Ta-30Nb,Ta-40Nb) USE: It is widely used in the fields of aerospace industry, medical equipment and so on. It can be used in the chemical industry, such as the digester, heater, cooler, etc time limit... more
Brand Name:Forged
Model Number:customized
Place of Origin:Luoyang Henan, China
Refractory Niobium Alloys Ta Nb Tantalum Niobium Alloy Target
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... new way of physical vapor deposition (PVD). The thin-film made by target is characterized by high density and good adhesiveness. As the magnetron sputtering techniques being widely applied, the high pure metal and alloy targets are in great need. Being
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... DC Magnetron Sputtering Power Supply Amount According To Target Amount Bias Power Supply Amount 1 Set PVD Coating Machine Advantage 1) Environmental Friendly 2) High Energy Efficiency 3) Easy Operation 4) ...
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Description of Titanium Gr5-eli Target Titanium Gr5-eli Target is called Titanium Grade 23—Titanium alloy (6 % aluminum, 4 %vanadium with extra low interstitial elements, ELI) Titanium Gr5-eli Target is a titanium alloy that is composed of 6 % aluminum...
Description of Titanium Gr5-eli Target Titanium Gr5-eli Target is called Titanium Grade 23—Titanium alloy (6 % aluminum, 4 %vanadium with extra low interstitial elements, ELI) Titanium Gr5-eli Target is a titanium alloy that is composed of 6 % aluminum... more
Brand Name:Changsheng
Model Number:ASTM
Place of Origin:China
Titanium Gr5-Eli Target Grade 23 Block For Dental Implant ASTM F136
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...Sputtering Deposition in Decorative Coating Field Applications Applications Specific Purpose Material Type Decorative coating Colored film, Metallized film Al2O3, TiO2, and all kinds of metal films Working Principle Magnetron sputtering is to increase sputtering rate by introducing a magnetic field on the target...
...Sputtering Deposition in Decorative Coating Field Applications Applications Specific Purpose Material Type Decorative coating Colored film, Metallized film Al2O3, TiO2, and all kinds of metal films Working Principle Magnetron sputtering is to increase sputtering rate by introducing a magnetic field on the target... more
Brand Name:ZEIT
Model Number:MSC-DC-X—X
Place of Origin:Chengdu, P.R.CHINA
Colored Metallized Film Magnetron Sputtering Coating Machine For Decorative Coating Field
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Torich 133*4*4113mm 304L Alloy Sputtering Sputtering Target Stainless Steel Tube Grade:304L Specification: 133*4*4113mm Tolerance of OD:0.1-0.4mm Tolerance of ID:124.5-125....